Lpcvd Silicon Nitride and Oxynitride Films: Material and ...
Habraken, F. H. P. M.![Lpcvd Silicon Nitride and Oxynitride Films: Material and Applications in Integrated Circuit Technology](https://support.digitalhusky.com/media/annotations/sorted/289/28950098/CHSBZCOP0328950098.jpg)
The present book collects a broad overview of chemical and physical char- acteristics of silicon oxynitrides. Special emphasis is put on the way in which these properties influence the electrical characteristics and behaviour of this important material. The results presented here were obtained in an ex- tended European research cooperation in the framework of ESPRIT Project 369 'Physical-chemical characterization of silicon oxynitrides in rela...